NY

Naoto Yanagihara

Fujitsu Limited: 25 patents #1,029 of 24,456Top 5%
FL Fujitsu Hitachi Plasma Display Limited: 2 patents #76 of 166Top 50%
FU Fujifilm: 1 patents #3,076 of 4,519Top 70%
Overall (All Time): #139,888 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #TitleCo-InventorsDate
7850503 Method of sealing a plasma display panel by means of glass frit incorporating spacer beads Minahiro Nonomura, Masayuki Seto, Yoshitaka Ukai, Ryouichi Miura 2010-12-14
7513194 Screen mask Masayuki Seto, Mikio Nakashima, Nobuyuki Ushifusa 2009-04-07
7205083 Recording material Yohsuke Takeuchi, Yoshimitsu Arai 2007-04-17
7025912 Microcapsule and manufacturing method thereof Satoru Yamada, Yuuichi Fukushige, Kyoko Senga 2006-04-11
6890880 Heat-sensitive recording material Hisao Yamada, Kazumori Minami 2005-05-10
6787502 Guanidine compound and heat sensitive recording material Hisao Yamada, Mitsuyuki Tsurumi 2004-09-07
6720421 PHENYLURETHANE COMPOUNDS AND METHODS FOR PRODUCING SAME, ASYMMETRIC UREA COMPOUNDS AND METHODS FOR PRODUCING SAME, BARBITURIC ACID DERIVATIVE, AND DIAZO THERMAL RECORDING MATERIAL CONTAINING THE DERIVATIVE Akinori Fujita, Yohsuke Takeuchi, Daisuke Arioka, Kimi Ikeda, Sachiko Arai 2004-04-13
6348529 Guanidine compound and heat sensitive recording material Hisao Yamada, Mitsuyuki Tsurumi 2002-02-19
6316605 Hydrazone dye Tatsuo Kawabuchi, Tetsunori Matsushita, Kimiatsu Nomura, Yohsuke Takeuchi, Hisao Yamada 2001-11-13
6228553 Pyrrolo [1,2-A] pyrimidine compound and heat-sensitive recording material using the same Tetsunori Matsushita, Masanobu Takashima, Mitsuyuki Tsurumi 2001-05-08
5935757 Heat-sensitive recording material Hisao Yamada, Yoshihiro Jinbo 1999-08-10
5866293 Heat-sensitive recording material Kimiatsu Nomura, Hiroshi Sato, Tetsunori Matsushita, Shojiro Sano 1999-02-02
5691271 Indolylazaphthalides and recording materials containing the same Kiyoshi Takeuchi, Toyohisa Oya, Naoki Asanuma, Masanobu Takashima, Syunsaku Higashi 1997-11-25
5652082 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same Masatoshi Yumoto, Ken Iwakura, Juniti Fujimori, Shinji Fujimoto, Minoru Maeda 1997-07-29
5595853 Optical image forming material Makoto Ono 1997-01-21
5576441 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same Masatoshi Yumoto, Ken Iwakura, Juniti Fujimori, Shinji Fujimoto, Minoru Maeda 1996-11-19
5532373 Aluminate complex and use thereof in photopolymerizable composition and image-forming material Hirotaka Matsumoto, Jun Yamaguchi, Hisashi Yamamoto 1996-07-02
5480765 Recording material Masanobu Takashima, Masato Shimazaki, Ken Iwakura, Tomohiro Kodama 1996-01-02
5409797 Heat-sensitive recording material for laser recording Noriyuki Hosoi, Masao Yabe 1995-04-25
5389489 Image-forming material Tosiaki Endo, Naotaka Wachi 1995-02-14
5244769 Light-sensitive image forming material Akihiko Takeda, Akira Igarashi 1993-09-14
5213939 Light- and heat-sensitive recording material Takekatsu Sugiyama, Sadao Ishige, Hiroshi Kamikawa, Keiichi Tateishi 1993-05-25
5051333 Optical image-recording material Ken Iwakura, Tosiaki Endo, Keiso Saeki 1991-09-24
4994431 Heat-sensitive recording material Ken Iwakura, Masato Satomura, Takayuki Hayashi 1991-02-19
4981835 Recording material Ken Iwakura, Takayuki Hayashi 1991-01-01