MI

Minoru Inoue

Fujitsu Limited: 13 patents #2,362 of 24,456Top 10%
PA Panasonic: 10 patents #2,582 of 21,108Top 15%
OC Olympus Optical Co.: 5 patents #667 of 2,334Top 30%
TC Toshiba Silicone Co.: 4 patents #26 of 169Top 20%
SS Suwa Seikosha: 3 patents #32 of 220Top 15%
TS Taiyo Nippon Sanso: 2 patents #48 of 203Top 25%
NS National Institute For Materials Science: 1 patents #361 of 901Top 45%
CG Chemetall Gmbh: 1 patents #87 of 196Top 45%
RI Rigaku: 1 patents #152 of 239Top 65%
RI Rigaku Industrial: 1 patents #15 of 51Top 30%
TO Toshiba: 1 patents #1,121 of 2,688Top 45%
TO Toto: 1 patents #620 of 1,113Top 60%
HE Hitachi Kokusai Electric: 1 patents #493 of 843Top 60%
Mazda Motor: 1 patents #2,563 of 4,755Top 55%
MC Mitsubishi Chemical: 1 patents #1,511 of 3,022Top 50%
📍 Himeji, JP: #18 of 1,500 inventorsTop 2%
Overall (All Time): #73,512 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 26–42 of 42 patents

Patent #TitleCo-InventorsDate
5514316 Slip casting method for manufacturing ceramic articles Tatsuhiro Kosugi, Mitsuru Saka, Akio Matsumoto, Toshiaki Nogami, Takazi Naotsuka +2 more 1996-05-07
5244556 Method for depositing thin film on substrate by sputtering process 1993-09-14
5190804 Coated inorganic hardened product Kazuo Seto, Motoaki Haruna, Hiroshi Kimura, Yasutoshi Nagano, Yasuhiro Kushida 1993-03-02
5091460 Coating composition, coated inorganic hardened product, and process for producing the product Kazuo Seto, Motoaki Haruna, Hiroshi Kimura, Yasutoshi Nagano, Yasuhiro Kushida 1992-02-25
5081064 Method of forming electrical contact between interconnection layers located at different layer levels Ryuji Iwama 1992-01-14
5071791 Method for forming metal layer Kouzi Hashizume 1991-12-10
5049251 Sputtering method for fabricating thin film 1991-09-17
4976839 Method of forming a barrier layer between a silicon substrate and an aluminum electrode of a semiconductor device 1990-12-11
4902582 Aluminum metallized layer formed on silicon wafer 1990-02-20
4810342 Method for controlling substrate temperature in a high temperature sputtering process 1989-03-07
4622447 Microwave apparatus for vacuum treating and heating a semiconductor substrate 1986-11-11
4517026 Method of backside heating a semiconductor substrate in an evacuated chamber by directed microwaves for vacuum treating and heating a semiconductor substrate 1985-05-14
4379236 Windmill generator apparatus 1983-04-05
4377765 Mode coupled tuning fork type quartz crystal vibrator and method of tuning Shigeru Kogure, Eishi Momosaki 1983-03-22
4356425 Electrode for tuning fork type quartz crystal vibrator Shigeru Kogure, Eishi Momosaki 1982-10-26
4320320 Coupled mode tuning fork type quartz crystal vibrator Eishi Momosaki, Shigeru Kogure 1982-03-16
4240264 Interior unit of a split type air-conditioning apparatus Minoru Nakada, Kenji Umezu, Yasuhiro Shinma, Kazuaki Kamiyama, Yoshihiro Udagawa +2 more 1980-12-23