JC

John L. Chagolla

FU Fujifilm Electronic Materials U.S.A.: 6 patents #22 of 77Top 30%
AC Arch Specialty Chemicals: 1 patents #42 of 79Top 55%
📍 Mesa, AZ: #351 of 2,463 inventorsTop 15%
🗺 Arizona: #5,222 of 32,909 inventorsTop 20%
Overall (All Time): #746,813 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8252704 Additives to prevent degradation of cyclic alkene derivatives Daniel J. Teff 2012-08-28
7985350 Additives to prevent degradation of cyclic alkene derivatives Daniel J. Teff 2011-07-26
7931823 Additives to prevent degradation of cyclic alkene derivatives Daniel J. Teff 2011-04-26
7883639 Additives to prevent degradation of cyclic alkene derivatives Daniel J. Teff 2011-02-08
7871536 Additives to prevent degradation of cyclic alkene derivatives Daniel J. Teff 2011-01-18
7531590 Additives to prevent degradation of alkyl-hydrogen siloxanes Daniel J. Teff, Gregory B. Smith, Tim Andreyka 2009-05-12
7129311 Additives to prevent degradation of alkyl-hydrogen siloxanes Daniel J. Teff, Gregory B. Smith, Tim Andreyka 2006-10-31