Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6255035 | Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices | John R. Lee | 2001-07-03 |
| 6218090 | Method of creating controlled discontinuity between photoresist and substrate for improving metal lift off | William R. Livesay | 2001-04-17 |
| 6150070 | Method of creating optimal profile in single layer photoresist | William R. Livesay | 2000-11-21 |