SC

Scott Chang

Dow Global Technologies: 3 patents #1,458 of 4,534Top 35%
RH Rohm And Haas Electronic Materials Cmp Holdings: 3 patents #73 of 239Top 35%
Overall (All Time): #1,466,831 of 4,157,543Top 40%
3
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10272541 Polishing layer analyzer and method Jeff Tsai, Francis V. Acholla, Andrew Wank, Mark Gazze, William A. Heeschen +3 more 2019-04-30
9770808 Method of manufacturing chemical mechanical polishing pads Francis V. Acholla, Andrew Wank, Mark Gazze, Jeff Tsai, William A. Heeschen +3 more 2017-09-26
9737971 Chemical mechanical polishing pad, polishing layer analyzer and method Francis V. Acholla, Andrew Wank, Mark Gazze, Jeff Tsai, William A. Heeschen +3 more 2017-08-22