YM

Yoshihisa Mizutani

DA Daicel: 9 patents #24 of 523Top 5%
KT Kabushiki Kaisha Toshiba: 9 patents #3,402 of 21,451Top 20%
TO Toshiba: 7 patents #92 of 2,688Top 4%
📍 Himeji, JP: #59 of 1,500 inventorsTop 4%
Overall (All Time): #153,719 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 1–25 of 26 patents

Patent #TitleCo-InventorsDate
10894759 Method and apparatus for producing acetic acid Hiroyuki Miura 2021-01-19
10661196 Process for producing acetic acid Masahiko Shimizu, Hiroyuki Miura 2020-05-26
10633322 Process for producing acetic acid Masahiko Shimizu, Hiroyuki Miura 2020-04-28
10562836 Process for producing acetic acid Masahiko Shimizu, Hiroyuki Miura 2020-02-18
10428006 Method and apparatus for producing acetic acid Hiroyuki Miura 2019-10-01
10428004 Method for producing acetic acid Masahiko Shimizu 2019-10-01
10265639 Process for producing acetic acid Masahiko Shimizu, Hiroyuki Miura 2019-04-23
10246399 Process for producing acetic acid Masahiko Shimizu, Hiroyuki Miura 2019-04-02
10183905 Method for producing acetic acid Masahiko Shimizu, Nobuyuki Hirabayashi 2019-01-22
6094244 Reflective liquid crystal display device Yasushi Kawata, Hajime Yamaguchi, Takeshi Yamaguchi, Seizaburo Shimizu, Miki Mori +1 more 2000-07-25
5172196 Nonvolatile semiconductor memory device Naohiro Matsukawa 1992-12-15
4954871 Semiconductor device with composite electrode Minoru Kimura 1990-09-04
4882707 Non-volatile semi-conductor memory device with double gate structure 1989-11-21
4878199 Semiconductor memory device 1989-10-31
4754320 EEPROM with sidewall control gate Susumu Kohyama, Koji Makita 1988-06-28
4745453 Semiconductor device 1988-05-17
4698659 Stacked complementary metal oxide semiconductor inverter 1987-10-06
4665418 Semiconductor memory device 1987-05-12
4661833 Electrically erasable and programmable read only memory 1987-04-28
4642880 Method for manufacturing a recessed semiconductor device Syunzi Yokogawa 1987-02-17
4637128 Method of producing semiconductor device 1987-01-20
4506279 Metal-oxide-semiconductor device with bilayered source and drain 1985-03-19
4479297 Method of fabricating three-dimensional semiconductor devices utilizing CeO.sub.2 and ion-implantation. Shinichiro Takasu 1984-10-30
4437225 Method of forming SOS devices by selective laser treatment and reactive formation of isolation regions 1984-03-20
4396930 Compact MOSFET device with reduced plurality of wire contacts 1983-08-02