Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8158310 | Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure | Hiroyuki Miyata, Takeshi Miyazaki, Kazuhiko Kobayashi | 2012-04-17 |
| 6989536 | Electron-beam writing device and electron-beam writing method | Osamu Masuda, Kazumi Furuta, Kazuhiko Kobayashi | 2006-01-24 |