Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6927405 | Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography | Laurence Bonnet, Danièle Babonneau | 2005-08-09 |
| 6724465 | Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range | Danièle Babonneau, Laurence Bonnet | 2004-04-20 |