Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9329472 | Method for manufacturing EUV masks minimizing the impact of substrate defects | Cyril Vannuffel | 2016-05-03 |
| 9116433 | Double-mask photolithography method minimizing the impact of substrate defects | Cyril Vannuffel | 2015-08-25 |