Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6876080 | Etch stop for copper damascene process | — | 2005-04-05 |
| 6025634 | Integrated circuit having formed therein low contact leakage and low contact resistance integrated circuit device electrode | — | 2000-02-15 |
| 5693563 | Etch stop for copper damascene process | — | 1997-12-02 |
| 5661085 | Method for forming a low contact leakage and low contact resistance integrated circuit device electrode | — | 1997-08-26 |