Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11881400 | Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same | Kazuhiro Yamanaka | 2024-01-23 |
| 11437237 | Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same | Kazuhiro Yamanaka | 2022-09-06 |
| 10087284 | Fluorine-containing polymerizable monomer and polymer compound using same | Makoto Matsuura, Kazuhiro Yamanaka | 2018-10-02 |
| 9778569 | Positive photosensitive resin composition, method for producing film using same, and electronic component | Makoto Seino, Kazuhiro Yamanaka, Masafumi Oda | 2017-10-03 |
| 9758694 | Curable resin composition, cured product thereof, and semiconductor device using the same | Masafumi Oda, Yutaka Sugita, Tsuyoshi Ogawa | 2017-09-12 |
| 9638998 | Silane composition and cured film thereof, and method for forming negative resist pattern using same | Tsuyoshi Ogawa, Kazuhiro Yamanaka | 2017-05-02 |
| 9550711 | Fluorine-containing polymerizable monomer and polymer compound using same | Makoto Matsuura, Kazuhiro Yamanaka | 2017-01-24 |
| 9512272 | Curable composition containing silicone, and cured product thereof | Katsuhiro AKIYAMA, Yu MATSUNO, Hiroshi Eguchi, Kazuhiro Yamanaka, Wataru KAWAI +1 more | 2016-12-06 |
| 9464163 | Novolak resin containing hexafluoroisopropanol group, method for producing same, and composition of same | Kazuhiro Yamanaka | 2016-10-11 |
| 9411231 | Silane composition and cured film thereof, and method for forming negative resist pattern using same | Tsuyoshi Ogawa, Kazuhiro Yamanaka | 2016-08-09 |
| 9080017 | Siloxane-based composition and cured product thereof, and use therefor | Kazuhiro Yamanaka, Hiroshi Eguchi, Takeshi Suda, Katsuhiro AKIYAMA | 2015-07-14 |
| 8981163 | Fluorine-containing aromatic compound and method for producing same | Makoto Matsuura, Kazuhiro Yamanaka | 2015-03-17 |