HH

Hans-Martin Hoevel

CG Carl Zeiss Smt Gmbh: 1 patents #657 of 1,189Top 60%
📍 Lippstadt, DE: #200 of 417 inventorsTop 50%
Overall (All Time): #2,606,181 of 4,157,543Top 65%
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Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11754934 Projection exposure apparatus for semiconductor lithography having an optical element with sensor reference and method for aligning the sensor reference Peter Nieland, Matthias Stepper 2023-09-12