PT

Patricius Jacobus Aloysius Tinnemans

AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
📍 Hapert, NL: #6 of 16 inventorsTop 40%
Overall (All Time): #3,320,852 of 4,157,543Top 80%
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Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7508491 Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity — 2009-03-24