SN

Shohei Nakamura

AC Asahi Kasei Kogyo Co.: 9 patents #37 of 1,395Top 3%
Nissan Motor Co.: 8 patents #916 of 8,689Top 15%
KI Kyoto Pharmaceutical Industries: 6 patents #5 of 57Top 9%
SC Sumitomo Electric Optifrontier Co.: 4 patents #12 of 57Top 25%
NT Ntn: 3 patents #452 of 1,364Top 35%
SC Sankyo Holdings Co.: 3 patents #223 of 700Top 35%
SC Screen Holdings Co.: 2 patents #326 of 686Top 50%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
Overall (All Time): #88,495 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
6063806 Indolyl or indolinyl derivatives and medicinal use thereof as ACAT or lipid peroxidation inhibitors Shoji Kamiya, Hiroaki Shirahase, Hiroshi Matsui, Katsuo Wada 2000-05-16
5990190 Photosensitive resin composition for photo-cast-molding Kousi Anai 1999-11-23
5990150 Heterocyclic derivatives, method of production thereof and pharmaceutical use thereof Hiroshi Matsui, Shoji Kamiya, Hiroaki Shirahase, Katsuo Wada 1999-11-23
5538973 Imidazole derivative, pharmaceutical use thereof, and intermediate therefor Hiroshi Matsui, Shoji Kamiya, Hiroaki Shirahase 1996-07-23
5288571 Photoresin printing plate for use in printing a corrugated board Kuniaki Minonishi 1994-02-22
5250389 Photosensitive elastomer composition Kousi Anai 1993-10-05
5242782 Method for producing a photocured image structure Shuji Kozaki 1993-09-07
4587186 Mask element for selective sandblasting and a method Yoshimasa Tuji 1986-05-06
4468453 Dry process for forming an image Nobuyasu Kinoshita 1984-08-28
4456680 Process for preparing a mask for sandblasting Yoshimasa Tuji 1984-06-26
4266005 Photosensitive elastomeric composition Yoshiyuki Suenaga 1981-05-05
4197130 Photosensitive elastomeric composition and element Kenichi Morotomi 1980-04-08