HA

Hideo Ai

AC Asahi Kasei Kogyo Co.: 11 patents #24 of 1,395Top 2%
AC Amada Co.: 1 patents #242 of 479Top 55%
📍 Fuji, JP: #8 of 12 inventorsTop 70%
Overall (All Time): #429,761 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
5019482 Polymer/oxime ester/coumarin compound photosensitive composition Nobuhiko Suga, Satoshi Ogitani, Hideaki Takahashi, Akihiko Ikeda 1991-05-28
D303673 Shearing machine 1989-09-26
4839261 Photocurable laminate Nobuo Nakazaki, Manabu Miyao 1989-06-13
4778859 Tetramine derived polyimide with pendant unsaturation, and various photosensitive compositions therefrom Akihiko Ikeda, Kan-ichi Yokota 1988-10-18
4767797 Photocurable compositions of poly(ethynylphenyl)acetylene, its copolymer and composition thereof Yohsuke Koizumi, Naohiro Tsuruta 1988-08-30
4756989 Image-forming materials sensitive to high-energy beam Nobuo Nakazaki, Manabu Miyao 1988-07-12
4754016 Process for preparing polyamide with organic phosphine/organic disulfide mixture condensing agent Akihiko Ikeda, Yoshio Matsuoka 1988-06-28
4702997 Photopolymerizable laminate Akihiko Ideda, Jiro Sato 1987-10-27
4667006 Poly(ethynylphenyl)acetylene, its copolymer and composition thereof Yohsuke Koizumi, Naohiro Tsuruta 1987-05-19
4645823 Polyamide preparation from polycarboxylic acid and polyamine with carbodiimide condensing agent Akihiko Ikeda, Yoshio Matsuoka 1987-02-24
4528332 Epoxy compounds, process for the preparation thereof and resist materials comprising thereof Akihiko Ikeda, Yoshio Matsuoka 1985-07-09
4447580 Resin composition, coating material comprising said resin composition and method for forming coatings Naohiro Tsuruta 1984-05-08