NO

Nobuyuki Otozawa

AC Asahi Glass Co.: 10 patents #189 of 2,251Top 9%
AG Agc: 2 patents #337 of 954Top 40%
Overall (All Time): #399,447 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12384897 Method for surface modification of fluororesin Ryuichi Sugimoto, Taiki Hoshino, Eisuke Murotani 2025-08-12
10975053 Production methods for 1,3-dioxolane compound and perfluoro(2,2-dimethyl-1,3-dioxole) Daisuke Jomuta, Yusuke TAKAHIRA, Chikaya Tamitsuji 2021-04-13
9969890 Fluorinated ether compound, composition for forming hard coating layer, and article having hard coating layer Kiyotaka Takao, Daisuke Jomuta, Kuniko Okano, Taiki Hoshino 2018-05-15
9637650 Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface-treated layer and method for its production Eisuke Murotani, Taiki Hoshino, Akira Isobe, Daisuke Shirakawa, Daisuke Jomuta 2017-05-02
9587119 Fluorinated ether compound, fluorinated ether composition, and coating liquid, as well as substrate having surface layer, and method for its production Taiki Hoshino 2017-03-07
9540404 Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface-treated layer and method for its production Eisuke Murotani, Taiki Hoshino, Akinobu Kunimoto, Daisuke Jomuta 2017-01-10
8901264 Copolymer and method for producing the same Kazunori Sugiyama, Toyomichi Shimada, Yuuichi Oomori, Minako Shimada 2014-12-02
8338529 Oil repellent copolymer, method for its production and oil repellent treatment solution Taiki Hoshino, Naoko Shirota, Akihiko Asakawa 2012-12-25
8193277 Water/oil repellent composition, method for its production and method for treating article Kazunori Sugiyama, Minako Shimada, Yuuichi Oomori 2012-06-05
8017709 Fluorinated polymer and fluorinated polymer composition containing it Toyomichi Shimada 2011-09-13
7964659 Antireflection coating composition 2011-06-21
7262243 Coating composition, antireflection film, photoresist and pattern formation method using it Toyomichi Shimada, Takashige Maekawa, Naoko Sumi 2007-08-28