Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10991589 | Correlation between conductivity and pH measurements for KOH texturing solutions and additives | Jennifer Rieker, Gim-Syang Chen, Dennis Nemeth | 2021-04-27 |
| 10181405 | Method for selective under-etching of porous silicon | — | 2019-01-15 |
| 10170350 | Correlation between conductivity and pH measurements for KOH texturing solutions and additives | Jennifer Rieker, Gim-Syang Chen, Dennis Nemeth | 2019-01-01 |
| 9337065 | Systems and methods for drying a rotating substrate | Zhi Lewis Liu, Hanjoo Lee | 2016-05-10 |
| 8987032 | Method for selective under-etching of porous silicon | — | 2015-03-24 |
| 8741066 | Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting | Thomas P. Nolan, Dennis Nemeth, Richard Novak | 2014-06-03 |
| 8739429 | Systems and methods for drying a rotating substrate | Zhi Lewis Liu, Hanjoo Lee | 2014-06-03 |
| 8276291 | Systems and methods for drying a rotating substrate | Zhi (Lewis) Liu, Hanjoo Lee | 2012-10-02 |
| 8084280 | Method of manufacturing a solar cell using a pre-cleaning step that contributes to homogeneous texture morphology | Gim-Syang Chen | 2011-12-27 |
| 8056253 | Systems and methods for drying a rotating substrate | Zhi (Lewis) Liu, Hanjoo Lee | 2011-11-15 |
| 7976718 | System and method for selective etching of silicon nitride during substrate processing | Gim-Syang Chen, Richard A. Novak | 2011-07-12 |
| 7644512 | Systems and methods for drying a rotating substrate | Zhi (Lewis) Liu, Hanjoo Lee | 2010-01-12 |
| 7311847 | System and method for point-of-use filtration and purification of fluids used in substrate processing | — | 2007-12-25 |
| 7169253 | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing | Gim-Syang Chen, Richard Novak | 2007-01-30 |
| 6928750 | Membrane dryer | Richard Novak, Larry Myland | 2005-08-16 |
| 6871657 | Low profile wafer carrier | Jim Bottos, Tom Mancuso | 2005-03-29 |
| 6863836 | Method for removal of photoresist using sparger | Richard Novak | 2005-03-08 |
| 6842998 | Membrane dryer | Richard Novak, Larry Myland | 2005-01-18 |
| 6840250 | Nextgen wet process tank | Richard Novak, Tom Mancuso, Jim Vadimsky | 2005-01-11 |
| 6837944 | Cleaning and drying method and apparatus | Gim-Syang Chen, Richard Ciari, Richard Novak | 2005-01-04 |
| 6818563 | Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles | Richard Novak, Gim-Syang Chen, Dennis Nemeth | 2004-11-16 |
| 6766818 | Chemical concentration control device | Richard Novak, Timothy J. Helmer | 2004-07-27 |
| 6767877 | Method and system for chemical injection in silicon wafer processing | CHANG-WEI KUO, Nick Yialamas, Gregory Skibinski | 2004-07-27 |
| 6649018 | System for removal of photoresist using sparger | Richard Novak | 2003-11-18 |
| 6626189 | Method of processing substrates using pressurized mist generation | Richard Novak, Dennis Nemeth, Gim-Syang Chen | 2003-09-30 |