Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D690575 | Handrail | Donna Raye Stark | 2013-10-01 |
| 6875415 | Resin preconditioning methods using carbon dioxide and methods for purifying hydrogen peroxide | Mary D. Havlicek, David L. Snyder, Marshall E. Cummings | 2005-04-05 |
| 6799883 | Method for continuously blending chemical solutions | Karl J. Urquhart, John Thompson | 2004-10-05 |
| 6537516 | Integrated method of preconditioning a resin for hydrogen peroxide purification and purifying hydrogen peroxide | Mary D. Havlicek, Wallace I. Yuan | 2003-03-25 |
| RE37972 | Manufacture of high precision electronic components with ultra-high purity liquids | R. Scot Clark, Stephen Baird | 2003-02-04 |
| 6471735 | Compositions for use in a chemical-mechanical planarization process | Ashutosh Misra, Anthony J. Schleisman | 2002-10-29 |
| 6372022 | Ionic purifier | Wallace I. Yuan | 2002-04-16 |
| 6350425 | On-site generation of ultra-high-purity buffered-HF and ammonium fluoride | R. Scot Clark | 2002-02-26 |
| 6214173 | On-site manufacture of ultra-high-purity nitric acid | Mindi Xu, Wallace I. Yuan, Tracey Jacksier, Hwa-Chi Wang, R. Scot Clark | 2001-04-10 |
| 6063356 | On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing | R. Scot Clark | 2000-05-16 |
| 6050283 | System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing | R. Scot Clark, Allen H. Jones, Jr. | 2000-04-18 |
| 6015477 | Point-of-use ammonia purification for electronic component manufacture | R. Scot Clark | 2000-01-18 |
| 6001223 | On-site ammonia purification for semiconductor manufacture | R. Scot Clark | 1999-12-14 |
| RE36290 | Manufacture of high precision electronic components with ultra-high purity liquids | R. Scot Clark, Stephen Baird | 1999-09-07 |
| 5846386 | On-site ammonia purification for semiconductor manufacture | R. Scott Clark | 1998-12-08 |
| 5846387 | On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing | R. Scot Clark | 1998-12-08 |
| 5785820 | On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing | R. Scot Clark | 1998-07-28 |
| 5755934 | Point-of-use ammonia purification for electronic component manufacture | R. Scot Clark | 1998-05-26 |
| 5722442 | On-site generation of ultra-high-purity buffered-HF for semiconductor processing | R. Scot Clark | 1998-03-03 |
| 5496778 | Point-of-use ammonia purification for electronic component manufacture | R. Scot Clark | 1996-03-05 |
| 5354428 | Apparatus for the continuous on-site chemical reprocessing of ultrapure liquids | R. Scot Clark, John B. Davison, David W. Persichini, Wallace I. Yuan, Bruce A. Lipisko +2 more | 1994-10-11 |
| 5242468 | Manufacture of high precision electronic components with ultra-high purity liquids | R. Scot Clark, Stephen Baird | 1993-09-07 |
| 5164049 | Method for making ultrapure sulfuric acid | R. Scot Clark, John B. Davison, David W. Persichini, Wallace I. Yuan, Bruce A. Lipisko +2 more | 1992-11-17 |
| 4855023 | Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids used in semiconductor wafer cleaning | R. Scot Clark, John B. Davison, Alan W. Jones, Allen H. Jones, Jr., David W. Persichini +2 more | 1989-08-08 |
| 4828660 | Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids | R. Scot Clark, John B. Davison, Alan W. Jones, Allen H. Jones, Jr., David W. Persichini +2 more | 1989-05-09 |