Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12298669 | Composition comprising three alkanolamines and a hydroxylamine for removing etch residues | Laisheng Sun, Lili Wang, Aiping Wu, Tianniu Chen | 2025-05-13 |
| 12281251 | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Wen Dar Liu, Aiping Wu, Laisheng Sun | 2025-04-22 |