Issued Patents 2025
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12331423 | Reaction chamber for a deposition reactor with interspace and lower closing element and reactor | Francesco Corea, Danilo Crippa, Maurilio Meschia, Yuichiro Tokuda | 2025-06-17 |
| 12325932 | Method for CVD deposition of n-type doped silicon carbide and epitaxial reactor | Gianluca Cividini | 2025-06-10 |
| 12195877 | Substrate support device for a reaction chamber of an epitaxial reactor with gas flow rotation, reaction chamber and epitaxial reactor | Maurilio Meschia | 2025-01-14 |