Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372869 | Method for forming resist pattern and radiation-sensitive resin composition | Kazuki Kasahara, Sosuke Osawa, Miki Tamada, Motohiro SHIRATANI | 2025-07-29 |
| 12259653 | Radiation-sensitive resin composition, method of forming resist pattern, and compound | — | 2025-03-25 |