MR

Manish Ranjan

AN Asml Holding N.V.: 1 patents #11 of 80Top 15%
AB Asml Netherlands B.V.: 1 patents #169 of 589Top 30%
📍 Eindhoven, OR: #1 of 4 inventorsTop 25%
Overall (2025): #289,263 of 469,880Top 65%
1
Patents 2025

Issued Patents 2025

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
12332570 Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris Ronald Peter Albright, Kursat Bal, Vadim Yevgenyevich Banine, Richard Joseph Bruls, Sjoerd Frans DE VRIES +13 more 2025-06-17