Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12288695 | Method of forming a transistor device having dipole-containing gate dielectric layer and fluorine-containing gate dielectric layer | Chung-Wei Hsu, Kuo-Cheng Chiang, Mao-Lin Huang, Lung-Kun Chu, Jia-Ni Yu +1 more | 2025-04-29 |
| 12266544 | Reversed tone patterning method for dipole incorporation for multiple threshold voltages | Lung-Kun Chu, Jia-Ni Yu, Kuo-Cheng Chiang, Chih-Hao Wang | 2025-04-01 |