Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11940725 | Phase shift blankmask and photomask for EUV lithography | Cheol Shin, Jong-Hwa Lee, Chul-Kyu YANG, Min-Kwang PARK, Mi-Kyung WOO | 2024-03-26 |
| 11927880 | Phase shift blankmask and photomask for EUV lithography | Chul-Kyu YANG, Min-Kwang PARK, Mi-Kyung WOO | 2024-03-12 |