JP

Jong Keun Park

RM Rohm And Haas Electronic Materials: 1 patents #16 of 35Top 50%
📍 Shrewsbury, MA: #39 of 133 inventorsTop 30%
🗺 Massachusetts: #5,064 of 14,432 inventorsTop 40%
Overall (2024): #404,113 of 561,600Top 75%
1
Patents 2024

Issued Patents 2024

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
12085854 Photoresist compositions and pattern formation methods Cong Liu, James F. Cameron, Sheng Liu, Tsutomu Asazuma, Mingqi Li 2024-09-10