Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12064845 | Formulations for chemical mechanical polishing pads with high planarization efficiency and CMP pads made therewith | Bryan E. Barton | 2024-08-20 |
| 12064846 | Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith | Bryan E. Barton, Annette M. Crevasse, Vere O. Archibald, Michael E. Mills | 2024-08-20 |