Issued Patents 2024
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12019973 | Method for reticle enhancement technology of a design pattern to be manufactured on a substrate | Akira Fujimura, P. Jeffrey Ungar | 2024-06-25 |
| 11953824 | Method for reticle enhancement technology of a design pattern to be manufactured on a substrate | Akira Fujimura, P. Jeffrey Ungar | 2024-04-09 |
| 11921420 | Method and system for reticle enhancement technology | Akira Fujimura, Ajay Baranwal | 2024-03-05 |
| 11886166 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2024-01-30 |