Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12043899 | Reactor system and method to reduce residue buildup during a film deposition process | Hyeongeu Kim, Tom Kirschenheiter, Mark Hawkins, Loren Jacobs | 2024-07-23 |
| 12040217 | Substrate lift mechanism and reactor including same | John DiSanto | 2024-07-16 |