Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11536872 | Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a project | Abderrezak Marzaki, Yoann Goasduff, Pascal Fornara | 2022-12-27 |