Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11506983 | Method of designing mask layout based on error pattern and method of manufacturing mask | Hungbae AHN, Seunghune Yang | 2022-11-22 |
| 11226552 | Method of manufacturing photomask set for forming patterns, and method of manufacturing semiconductor device using the photomask set | Hungbae AHN, Sunggon Jung | 2022-01-18 |