JW

Jiun-Fang Wang

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #9 of 24Top 40%
📍 Hsinchu, NJ: #12 of 18 inventorsTop 70%
Overall (2022): #402,680 of 548,613Top 75%
1
Patents 2022

Issued Patents 2022

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11339308 Chemical mechanical polishing method Wei-Wen Tsai, Lin-Chen Ho, Cheng-Ping Lee 2022-05-24