Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11531279 | System and method for optimizing a lithography exposure process | Elvino da Silveira, Keith Frank Best, Wayne Fitzgerald, Jian Lu, Xin Song +1 more | 2022-12-20 |
| 11353800 | Conformal stage | J. Casey Donaher, Edward J. Ficarra | 2022-06-07 |