Issued Patents 2022
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11505743 | Chemical solution and method for treating substrate | Nobuaki Sugimura, Hiroyuki Seki | 2022-11-22 |
| 11499099 | Etching composition | Kazutaka Takahashi, William A. Wojtczak | 2022-11-15 |
| 11479863 | Chemical solution and method for treating substrate | Nobuaki Sugimura, Hiroyuki Seki | 2022-10-25 |
| 11410859 | Treatment liquid | Tetsuya KAMIMURA | 2022-08-09 |
| 11412607 | Atomic beam generator, bonding apparatus, surface modification method, and bonding method | Seiichi Hata, Junpei Sakurai, Yuuki Hirai, Hiroyuki Tsuji, Takayoshi Akao +1 more | 2022-08-09 |
| 11401487 | Cleaning formulation for removing residues on surfaces | Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer | 2022-08-02 |
| 11397383 | Treatment liquid, method for washing substrate, and method for removing resist | Tetsuya KAMIMURA | 2022-07-26 |
| 11361820 | Semiconductor memory device to hold 5-bits of data per memory cell | Masanobu Shirakawa, Osamu Torii, Marie Takada | 2022-06-14 |
| 11286444 | Cleaning formulation for removing residues on surfaces | Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer | 2022-03-29 |
| 11274250 | Chemical solution and method for treating substrate | Nobuaki Sugimura, Hiroyuki Seki | 2022-03-15 |
| 11239093 | Method for treating substrate, method for manufacturing semiconductor device, and kit for treating substrate | Nobuaki Sugimura, Hiroyuki Seki | 2022-02-01 |
| 11225633 | Treatment liquid, method for washing substrate, and method for removing resist | Tetsuya KAMIMURA | 2022-01-18 |