Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11340528 | Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer | Sosuke Osawa, Hajime INAMI, Kanako Ueda, Atsuto Nishii | 2022-05-24 |