Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11469085 | Vacuum plasma workpiece treatment apparatus | Johannes Weichart | 2022-10-11 |
| 11217434 | RF capacitive coupled dual frequency etch reactor | Johannes Weichart | 2022-01-04 |
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11469085 | Vacuum plasma workpiece treatment apparatus | Johannes Weichart | 2022-10-11 |
| 11217434 | RF capacitive coupled dual frequency etch reactor | Johannes Weichart | 2022-01-04 |