NY

Naofumi Yoshida

Merck: 2 patents #103 of 712Top 15%
📍 Yokohama, JP: #103 of 228 inventorsTop 50%
Overall (2022): #125,615 of 548,613Top 25%
2
Patents 2022

Issued Patents 2022

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11467494 Positive type photosensitive polysiloxane composition Takashi Fuke, Atsuko NOYA 2022-10-11
11392032 Positive type photosensitive siloxane composition and cured film formed by using the same Megumi Takahashi, Katsuto Taniguchi 2022-07-19