Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11487204 | Resist material | Tomoyuki Imada, Shinya Yamamoto | 2022-11-01 |
| 11479569 | Compound, photopolymerization initiator, photocurable composition and cured product thereof, and photocurable ink and print using the same | Tomokazu Yamada, Yong Fang, Fangxi Xiu, Changjun Deng | 2022-10-25 |
| 11472763 | Calixarene compound, curable composition, and cured product | Shinya Yamamoto, Yutaka Kadomoto, Tomoyuki Imada, Hidetomo Kai | 2022-10-18 |