Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11456178 | Gate interface engineering with doped layer | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Patricia M. Liu, Malcolm J. Bevan +1 more | 2022-09-27 |
| 11282936 | Horizontal gate all around device nanowire air gap spacer formation | Shiyu Sun, Nam Sung Kim, Bingxi Wood, Naomi Yoshida, Miao Jin | 2022-03-22 |
| 11271097 | Cap oxidation for FinFET formation | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Patricia M. Liu, Malcolm J. Bevan +1 more | 2022-03-08 |