Issued Patents 2021
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199779 | Developer composition, for EUV light source, for forming photosensitive photoresist micropattern | Su Jin Lee, Seung Hun Lee | 2021-12-14 |
| 11187985 | Method and composition for improving LWR in patterning step using negative tone photoresist | Su Jin Lee, Seung Hun Lee, Seung Hyun Lee | 2021-11-30 |
| 11169442 | EUV developer composition for forming photosensitive photoresist micropattern | Su Jin Lee, Seung Hun Lee, Seung Hyun Lee | 2021-11-09 |
| 11169444 | Method and composition for improving LWR in patterning step using negative tone photoresist | Su Jin Lee, Seung Hun Lee, Seung Hyun Lee | 2021-11-09 |
| 11036134 | High etch resistance spin-on carbon hard mask composition and patterning method using same | Su Jin Lee, Seung Hyun Lee, Seung Hun Lee | 2021-06-15 |