Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11131927 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article | Shota Katayama, Kazuaki Ebisawa | 2021-09-28 |
| 11061326 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | Yasushi Kuroiwa, Shota Katayama, Kazuaki Ebisawa | 2021-07-13 |
| 11022880 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | Yuta Yamamoto, Kazuaki Ebisawa, Yasushi Kuroiwa | 2021-06-01 |
| 10995234 | Method of producing structure containing phase-separated structure | Takahiro Dazai, Hitoshi Yamano, Ken Miyagi | 2021-05-04 |