Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11086221 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2021-08-10 |