Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11192971 | Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device | Koji Asakawa, Shinobu Sugimura | 2021-12-07 |
| 11192972 | Polymer material, composition, and method of manufacturing semiconductor device | Koji Asakawa, Shinobu Sugimura | 2021-12-07 |
| 11177129 | Method of manufacturing semiconductor device, method of forming pattern film, and metal-containing organic film | Koji Asakawa, Shinobu Sugimura | 2021-11-16 |
| 11161999 | Pattern formation method, block copolymer, and pattern formation material | Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura | 2021-11-02 |