Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211282 | Apparatus to reduce contamination in a plasma etching chamber | Xue Yang Chang | 2021-12-28 |
| 11199267 | Symmetric flow valve for higher flow conductance | Yogananda Sarode Vishwanath, Xue Yang Chang, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan | 2021-12-14 |