Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11126085 | Bias correction for lithography | — | 2021-09-21 |
| 11062878 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2021-07-13 |
| 10884395 | Method and system of reducing charged particle beam write time | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2021-01-05 |