Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10899945 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +4 more | 2021-01-26 |