Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11163234 | Photosensitive resin composition and method for producing cured relief pattern | Mitsutaka Nakamura, Taihei INOUE, Tatsuya Hirata, Takahiro Sasaki | 2021-11-02 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11163234 | Photosensitive resin composition and method for producing cured relief pattern | Mitsutaka Nakamura, Taihei INOUE, Tatsuya Hirata, Takahiro Sasaki | 2021-11-02 |