Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10790187 | Post-etch residue removal for advanced node beol processing | Emanuel I. Cooper, Makonnen Payne, WonLae Kim, Sheng-Hung Tu, Chieh-Ju Wang +1 more | 2020-09-29 |
| 10577567 | Cleaning compositions for removing post etch residue | Makonnen Payne, Emanuel I. Cooper, WonLae Kim, Sean Kim | 2020-03-03 |