Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10465096 | Metal chemical mechanical planarization (CMP) composition and methods therefore | Mark Leonard O'Neill | 2019-11-05 |
| 10253216 | Additives for barrier chemical mechanical planarization | Matthias Stender, Maitland Gary Graham, Dnyanesh Chandrakant Tamboli | 2019-04-09 |
| 10217645 | Chemical mechanical polishing (CMP) of cobalt-containing substrate | James Allen Schlueter, Mark Leonard O'Neill | 2019-02-26 |