Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10353291 | Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article | Eiichi Shimura, Shinji Kumada | 2019-07-16 |
| 10261415 | Chemically amplified positive-type photosensitive resin composition | Makiko Irie | 2019-04-16 |