Issued Patents 2019
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510877 | Semiconductor structure | Ru-Shang Hsiao, Chih-Mu Huang | 2019-12-17 |
| 10510671 | Method for forming semiconductor device structure with conductive line | Shyh-Wei Cheng, Yun-Min Chang, Chen-Chieh Chiang, Jung-Chi Jeng | 2019-12-17 |
| 10483167 | Method for manufacturing dual FinFET device | Wei-Barn Chen, Ting-Huang Kuo, Shiu-Ko JangJian, Kuang-Yao Lo | 2019-11-19 |
| 10483112 | Metal gate stack having TaAlCN layer | Shiu-Ko JangJian, Ting-Chun Wang, Chi-Wen Liu | 2019-11-19 |
| 10475790 | Asymmetric gate pitch | Wei-Barn Chen, Shiu-Ko JangJian, Ting-Huang Kuo | 2019-11-12 |
| 10340300 | Image sensor with trenched filler grid | Feng-Chien Hsieh, Chen Hsin-Chi, Shih-Ciang Huang, Wang Chun-Ying, Volume Chien +1 more | 2019-07-02 |
| 10340192 | FinFET gate structure and method for fabricating the same | Shiu-Ko JangJian, Ren-Hau Yu | 2019-07-02 |
| 10340301 | Support structure for integrated circuitry | Volume Chien, Yun-Wei Cheng, I-I Cheng, Shiu-Ko JangJian, Chih-Mu Huang | 2019-07-02 |
| 10312092 | Semiconductor structure and manufacturing method thereof | Ru-Shang Hsiao, Chih-Mu Huang | 2019-06-04 |
| 10297691 | Method for forming semiconductor device with P/N stacked layers | Hung-Pin Chen, Ru-Shang Hsiao, Li-Yi Chen | 2019-05-21 |
| 10276720 | Method for forming fin field effect transistor (FINFET) device structure | Wei-Barn Chen, Ting-Huang Kuo, Shiu-Ko JangJian | 2019-04-30 |
| 10276620 | Image sensor device and method for forming the same | Volume Chien, Yun-Wei Cheng, Zhe-Ju Liu, Kuo-Cheng Lee, Chuan-Pu Liu | 2019-04-30 |
| 10269845 | Mechanisms for forming image sensor device | Volume Chien, Yun-Wei Cheng, Shiu-Ko JangJian, Zhe-Ju Liu, Kuo-Cheng Lee | 2019-04-23 |